Hitachi H-9500 High-resolution TEM

This is an ultra high-resolution microscope with an accelerated voltage of 300 kV; a point-to-point resolution of 0.18 nm and a lattice resolution of 0.10 nm. A SC-1000 Orius® TEM CCD Camera (4008 x 2672 pixels) is attached to the microscope allowing quick and efficient searching of areas within the sample and viewing and recording high resolution images with ease. An EDAX EDS system is also attached to the H-9500 allowing chemical analysis at the nanoscale.  




This TEM has an accelerated voltage of 120 kV and a point resolution of 0.34 nm. It is equipped with an oxford INCA EDS system for X-ray microanalysis. This microscope is suitable for microstructure characterization of biological, polymer and inorganic materials. It is also an excellent tool for TEM teaching and training.



Hitachi S-5000H cold Field Emission SEM

Hitachi S-5000H is an ultra high-resolution SEM with a cold field emission source. It has a resolution of 0.6nm at 30 kV and 3.5 nm at 1 kV in secondary electron image. The magnification is from 30 x ~ 2000 for low mag mode and from 250 x ~ 1000000 X for high mag mode. This SEM has PCI Digital Imaging software for digital image recording.


Hitachi S-3000N Variable Pressure SEM

This SEM has 3.0 nm resolution at high vacuum and 4.0 nm resolution at low vacuum. It is computer control for ultimate ease of use. Examination of insulating and biological samples is possible at low vacuum without the need of coating a conductive layer on the sample surface. This SEM is attached with an EDS system allowing chemical composition analysis and elemental mapping.


Hitachi S-4800 II FE SEM

S-4800 II is an ultra-high-resolution SEM capable of ultra-low voltage imaging and handling large specimens up to 6" of a variety of sample types. It features a resolution of 1.0 nm, a variable acceleration voltage of .5 - 30 kV. It is capable of STEM imaging at 30kV, which is useful for STEM imaging for biological samples that cannot withstand high accelerating voltage in standard TEM. This SEM is attached with an EDS system allowing chemical composition analysis and elemental mapping.


FEI Strata 400 Dual Beam FIB

Strata 400 DualBeam system is a fully digital FE-SEM equipped with Focused Ion Beam (FIB). It features ultra-high resolution (<1 nm) electron optics allowing for fast and simple high resolution imaging for complete structural analysis and high-resolution Ion Optics (~7 nm) with optimized system architecture for automation with full access to E-beam, I-beam, patterning and gas chemistry functionality. It also equips with an Omniprobe sample extraction system for lift-out TEM specimen preparation. The integrated iterative thinning and SEM imaging allowing for complete in-situ sample preparation and high-resolution analysis by conducting simultaneous imaging and patterning.

Park XE-70

Park XE 70 AFM

This AFM is featured with compact mechanical design and flexible sample handling. It has 50 µm ?50 µm XY scan range, 12 µm Z scan range and a manual optics stage.


Hysitron Ubi®1 Nano Indenter 

This instrument has capabilities for Nanoindentation (hardness and elastic modulus); Nanoscratch (friction, wear, etc.) and SPM imaging.


Perkin-Elmer Phi 560 XPS/Auger System

Phi 560 ESCA/SAM is a multi-technique surface analysis system to meet the most demanding needs of the surface scientist or materials analyst. It is equipped with a standard Mg/Al source. It has capabilities of XPS, and Auger and can provide surface composition; chemical state of elements at the near surface region and compositional depth profiling via Ar+ sputtering.


Bruker D8 Advance X-ray diffractometer

This system has the para-focusing Bragg-Brentano geometry and parallel beam geometry and three sample stages (rotational stage, compact Eulerian Cradle and reflectometry sample stage). It has multi configurations enabling a variety of applications of identification of crystalline phase of solid or liquid samples, film thickness and roughness, lattice mismatch and relaxation for epitaxial films; thin films grazing incidence diffraction for phase identification of very thin films; texture analysis of orientation identification and residual stress determination of the films.


X-ray Diffraction Facility

There are five automated x-ray sources that are configured to perform 6 different x-ray diffraction experiments: a) theta - 2theta powder diffraction, b) glancing angle diffraction for thin film characterization, c) Laue diffraction, d) Lang topography, e) triple axis high resolution diffractometry, and d) texture analysis. 


The DXR Raman Microscope

TThis Raman microscope has high spatial resolution, confocal depth-profiling, mapping and the ease of sample preparation.


Thermo Nicolet 6700 FTIR Spectrometer

This spectrometer is able to collect spectra in the mid-IR, far-IR and near-IR spectral ranges.


Thermal Analysis Systems

Three Perkin-Elmer TAC7/DX Series systems: (1) Differential Scanning Calorimeter (DSC7); (2) Thermomechanical Analyzer (TMA7); (3) Thermogravimetric Analyzer (TGA7).


Optical Microscopes

Four optical microscopes furnished with a digital camera are available for general surface and microstructure observations: (1) Nikon labophot-2; (2) Nikon Eclipse L150; (3) Nikon Eclipse ME600 and (4) Nikon SMZ 1500.



SEM Sample Preparation Facility

Two sputtering systems: (1) CrC-100 and (2) Hummer VI are available for coating conductive layers on non-conductive samples for SEM observation.


TEM Sample Preparation Facility

(1) Two Gatan model 691 precise ion polishing systems (PIPS)
(2) One Gatan dual Ion mill polishing system.
(3) One Gatan model 656 dimpler grinder.
(4) Two low speed diamond saws.
(5) One Teckcut 5 cutting machine.